杜驚雷

杜驚雷，男，漢族，1964年9月生，四川大學理學博士，四川大學物理學院教授，博士生導師。

基本介紹

• 中文名：杜驚雷
• 國籍：中國
• 民族：漢族
• 出生日期：1964年9月
• 畢業院校：四川大學
• 學位/學歷：博士
• 職稱：教授

人物經歷

1979-1983年，南開大學物理系，理學學士；

杜驚雷

1985-1988年，中國科學院長春光學精密機械研究所光學專業，理學碩士；

1996-1999年，四川大學物理科學與技術學院光學專業，理學博士。

自1985年以來，先後從事雷射技術、信息光學、微納加工技術和微納光子學等領域的理論和實驗研究工作，並於1996年到四川大學物理科學與技術學院任教至今，其中2001-2002年間，曾在英國盧瑟福實驗室、新加坡南洋理工大學進行微納光學方面的學術研究。

研究領域

1. 金屬/介質納米結構光調控的理論和實驗研究

2. 納米光學結構加工方法和Metamaterals製備技術的研究

3. 納米光子學在生物大分子成像中的套用研究

4. 光自旋霍爾效應、有機自旋電子學等

學術成果

目前，已在數字光刻、表面等離子激元光刻、遠場超分辨成像技術、生物醫學光子學技術、納米光子結構在有機光電子器件套用等方面，主持/主研國家自然科學基金等科研項目20餘項。在學術刊物上發表論文120餘篇，SCI收錄論文約50篇。

部分研究論文：

1. Y. Hou, S. Li, Y. Su, X. Huang, Y. Liu, L. Huang, Y. Yu, F. Gao, Z. Zhang, J. Du. Design and fabrication of three-dimensional chiral nanostructures based on stepwise glancing angle deposition technology. Langmuir. 2013, 29(3): 867-872.

2. Z. Y. Zhang, S. Ye, S. H. Li, Z. Yang, J. L. Du, F. H. Gao, R. Y. Shi, B. C. Yang, X. W. Guo. Fabrication of nanopore array based on the nanometer silver pore-mirror device. Microelectronic Engineering. 2012, 98: 151-154.

3. X. H. Sun, L. P. Xia, J. L. Du, S. Y. Yin, C. L. Du. A hybrid long-range surface plasmon waveguide comprising a narrow metal stripe surrounded by the low-index dielectric regions. Optics Communications. 2012, 285(21-22): 4359-4363.

4. S. Shi, Z. Y. Zhang, J. L. Du, Z. Yang, R. Y. Shi, S. H. Li, F. H. Gao. Surface-plasmon-polaritons-assisted nanolithography with dual-wavelength illumination for high exposure depth. Optics Letters. 2012, 37(2): 247-249.

5. Y. D. Hou, S. H. Li, S. Ye, S. Shi, M. G. Zhang, R. Y. Shi, J. L. Du, C. L. Du. Using self-assembly technology to fabricate silver particle array for organic photovoltaic devices. Microelectronic Engineering. 2012, 98: 428-432.

6. Y. K. Zhang, J. L. Du, X. Z. Wei, L. F. Shi, Q. L. Deng, X. C. Dong, C. L. Du. Resolution and stability analysis of localized surface plasmon lithography on the geometrical parameters of soft mold. Applied Optics. 2011, 50(13): 1963-1967.

7. S. Ye, Y. D. Hou, R. Y. Zhu, S. L. Gu, J. Q. Wang, Z. Y. Zhang, S. Shi, J. L. Du. Synthesis and Photoluminescence Enhancement of Silver Nanoparticles Decorated Porous Anodic Alumina. Journal of Materials Science & Technology. 2011, 27(2): 165-169.

8. L. L. Tang, J. C. Yin, G. S. Yuan, J. L. Du, H. T. Gao, X. C. Dong, Y. G. Lu, C. L. Du. General conformal transformation method based on Schwarz-Christoffel approach. Optics Express. 2011, 19(16): 15119-15126.

9. S. Shi, Z. Y. Zhang, R. Y. Shi, X. Y. Niu, S. H. Li, M. Li, J. Q. Wang, J. L. Du, F. H. Gao, C. L. Du. Analysis of fabricating arbitrary nanoscale patterns by LSPP direct writing lithography with two-dimensional metal hole-array. Microelectronic Engineering. 2011, 88(8): 1931-1934.

10. X. P. Li, S. Shi, Z. Y. Zhang, J. Q. Wang, S. H. Li, F. H. Gao, R. Y. Shi, J. L. Du, C. L. Du, Y. X. Zhang. Experimental analysis of solid immersion interference lithography based on backside exposure technique. Microelectronic Engineering. 2011, 88(8): 2509-2512.

11. Y. K. Zhang, X. C. Dong, J. L. Du, X. Z. Wei, L. F. Shi, Q. L. Deng, C. L. Du. Nanolithography method by using localized surface plasmon mask generated with polydimethylsiloxane soft mold on thin metal film. Optics Letters. 2010, 35(13): 2143-2145.

12. J. Q. Wang, H. M. Liang, X. Y. Niu, J. L. Du, S. Ye, Z. Y. Zhang. Enhancing exposure depth for surface-plasmon polaritons interference nanolithography by waveguide modulation. Journal of Applied Physics. 2010, 108(1): 014308.

13. S. Shi, Z. Y. Zhang, M. Y. He, X. P. Li, J. Yang, J. L. Du. Analysis of surface-plasmon-polaritons-assisted interference imaging by using silver film with rough surface. Optics Express. 2010, 18(10): 10685-10693.

14. X. Y. Niu, Y. M. Qi, J. Q. Wang, Z. Y. Zhang, J. L. Du, Y. K. Guo, R. Y. Shi, M. Gong. Approach of enhancing exposure depth for evanescent wave interference lithography. Microelectronic Engineering. 2010, 87(5-8): 1168-1171.

15. M. Y. He, Z. Y. Zhang, S. Shi, J. L. Du, X. P. Li, S. H. Li, W. Y. Ma. A practical nanofabrication method: surface plasmon polaritons interference lithography based on backside-exposure technique. Optics Express. 2010, 18(15): 15975-15980.

16. H. M. Liang, H. B. Wang, X. Y. Zhao, J. L. Du, J. G. Yang, Y. Ma, J. B. Li, S. L. Hu. High efficiency picosecond pulse C(6)H(12) Raman laser amplified by DCM fluorescence. Laser Physics. 2009, 19(3): 424-427.

17. Z. Y. Zhang, J. L. Du, X. W. Guo. High-efficiency transmission of nanoscale information by surface plasmon polaritons from near field to far field. Journal of Applied Physics. 2007, 102(7): 074301.

18. B. L. Luo, C. C. Wang, J. L. Du, C. Ma, Y. K. Guo, J. Yao. Design and analysis of phase gratings for laser beams coherent combination. Microelectronic Engineering. 2006, 83(4-9): 1368-1371.

19. X. W. Guo, J. L. Du, Y. K. Guo, J. Yao. Large-area surface-plasmon polariton interference lithography. Optics Letters. 2006, 31(17): 2613-2615.

20. S. J. Liu, J. L. Du, X. Duan, B. L. Luo, X. G. Tang, Y. K. Guo, Z. Cui, C. L. Du, J. Yao. Enhanced Dill exposure model for thick photoresist lithography. Microelectronic Engineering. 2005, 78-79: 490-495.