左則文，1978年生，安徽郎溪人，博士，安徽師範大學物理與電子信息學院副教授，碩士生導師。
基本介紹
- 中文名：左則文
- 職業：教師
- 學位/學歷：博士
- 專業方向：矽基納米材料
- 任職院校：安徽師範大學物理與電子信息學院
人物經歷,研究方向,講授課程,學術成果,
人物經歷
1996年–2000年，安徽師範大學物理系學習並獲得理學學士學位；
2005年– 2010年，南京大學物理系學習並獲得工學博士學位；
2016.3-2016.8，香港中文大學物理系，訪問學者；
2000年－，安徽師範大學物理與電樂漏朽歸子信息學院助教、講師、副教授；
研究方向
矽基納米材料、金屬納米材料及其在太陽電池、感測器等方探笑府面的套用
講授課程
1. 半導體物理學
2. 光纖感測原理及套用
學術成果
科研項目：
1.國家自然科學基金面上項目：鋁納米結構等離激元光學特性調控及其在鈣鈦礦太陽電池中的套用，2019-2022年，主持。
2.國家自然科學基金青年項目：實現界面鈍化的單晶矽/非晶矽納米線異質結太陽電池研究，槳蒸境2012-2014年，主持。
3.安徽省自然科學基金項目：超細矽納米線的可控制備與發光特性研究，2013-2015年，主持。
4.國家重點實驗室開放課題：重摻雜矽納米晶實現近紅外局域表面電漿共振及其調控研究，2013-2015年，棵墓腳主持。
5. 國家重點實驗室開放課題：多孔矽納米線的可控制備與發光特性調控，2016-2018年，套多主持。
6. 973項目：半導體納米線結構恥驗承調控、集成及光電器件套用基礎，2007-2011年，參與。
7.國家自然科學基金項目：矢量光束甩埋寒斷的產生和調控機理及其在氣溶膠微粒捕獲上的套用，2014-2017，第一參與人。
部分學術論文：
1. Z. W. Zuo*,Y. B Wen, S. Zhang, Interface-induced nucleation and growth: a new route for fabricating ordered silver nanohole arrays, Nanoscale, 10, 14039 (2018).
2.Z. W. Zuo*,K. Zhu, Y. B. Wen, S. Zhang, Quadrupolar plasmon resonance in arrays composed of small-sized Ag nanoparticles prepared by a dewetting method, Applied Surface Science, 454, 270 (2018).
3. Z. W. Zuo*,Y. B Wen, S. Zhang, J. Qu, G. L. Cui, Y. Shi, Enhanced plasmon coupling of partly embedded gold nanospheres with surrounding silicon, Nanotechnology, 28, 285201 (2017).
4. Z. W. Zuo*, K. Zhu, C. Gu, Y. B. Wen, G. L. Cui, J. Qu, Transparent, flexible surface enhanced Raman scattering substrates based on Ag-coated structured PET (polyethylene terephthalate) for in-situ detection, Applied Surface Science, 379, 66 (2016).
5.Z. W. Zuo*, K. Zhu, L. X. Ning, G. L. Cui, J. Qu, W. X. Huang,Y. Shi,H. Liu, Composite silicon nanostructure arrays fabricated on optical fibre by chemical etching of multicrystal silicon film, Nanotechnology, 26, 155601 (2015).
6.Z. W. Zuo*, K. Zhu, L. X. Ning, G. L. Cui, J. Qu, Y.Cheng,J. Z. Wang, Y. Shi, D. S. Xu, Y. Xin, Highly sensitive surface enhanced Raman scattering substrates based on Ag decorated Si nanocone arrays and their application in trace dimethyl phthalate detection, Applied Surface Science, 25, 45 (2015).
7.Z. W. Zuo*, K. Zhu, G. L. Cui, W. X. Huang, J. Qu, Y. Shi, Y. S. Liu, G. B. Ji, Improved antireflection properties and optimized structure for passivation of well-separated, vertical silicon nanowire arrays for solarcell applications, Solar Energy Materialsand Solar Cells, 125, 248 (2014).
8. Z. W. Zuo*, G. L. Cui, Y. Shi, Y. S. Liu, G. B. Ji, Gold-thickness-dependent Schottky barrier height for charge transfer in metal-assisted chemicaletching of silicon, Nanoscale Research Letters 8, 193 (2013) .
9. Z. W. Zuo, G. L. Cui, Y. Wang,J. Z. Wang, L. Pu, Y. Shi*, Substrate-thickness dependence of hydrogenated microcrystalline silicon nucleation rate on amorphous silicon layer, Chemical Vapor Deposition 19, 363(2013).
10. Z. W. Zuo, G. L. Cui, Y. Wang,J. Z Wang, L. Pu, and Y. Shi*, GISAXS and ATR-FTIRstudies onstress-inducedmicrostructureevolution of a-Si:H under H2plasmaexposure, Chinese Physics Letters 29, 106801 (2012).
11. Z. W. Zuo, Y. Wang, J. Lu, J. Z. Wang, L. Pu, Y. Shi*, Y. D. Zheng, High rate deposition of microcrystalline silicon films using jet-type inductively coupled plasma chemical vapor deposition, Vaccum 86, 924 (2012).
12. Z. W. Zuo, W. T. Guan, Y. Wang, J. Lu, J. Z. Wang, L. Pu, Y. Shi*, Y. D. Zheng, X. Y. Luo, H. H. Wang, Influence of ultrathin amorphous silicon layers on the nucleation of microcrystalline silicon under hydrogen plasma treatment, Applied Physics Letters 98, 041902 (2011).
13. Z. W. Zuo, W. T. Guan, Y. Xin, J. Lu, J. Z. Wang, L. Pu, Y. Shi*, Y. D. Zheng, Growth and microstructure properties of microcrystalline silicon films deposited using jet-ICPCVD, Journal of Semiconductor 32 (3), 032001 (2011).
14. Z. W. Zuo, W. T. Guan, Y. Xin, J. Lu, J. Z. Wang, L. Pu, Y. Shi*, Y. D. Zheng, Crystallization control of the incubation layer in microcrystalline silicon films deposited by using jet-ICPCVD, Electrochemical and Solid-State Letters 13, H55 (2010).
15. Z. W. Zuo, Y. Wang, Y. Xin, J. Lu, J. Z. Wang, L. Pu, Y. Shi*, Y. D. Zheng, Structural evolution of the incubation layer in microcrystalline silicon films deposited by Jet-ICPCVD, 10th International Conference on Solid-state and Integrated-circuit Technology Shanghai, 1-4, Nov., 1536 (2010).
16. Y. S. Liu, G. B. Ji*, J. Y. Wang, X. Q. Liang, Z. W. Zuo, Y. Shi,Fabrication and photocatalytic properties of silicon nanowires by metal-assisted chemical etching: effect of H2O2concentration,Nanoscale Research Letters 7, 663 (2012).
17. J. Z. Wang, Z. Q. Shi, Z. S. Tao, X. L. Zhang, Z. W. Zuo, L. Pu, R. Zhang, Y. D. Zheng, F. Lu, Y. Shi*, Thermal treatment on the sensitization effect in Er-doped Si/Al2O3superlattices, ACTA PHYSICA SINICA 58, 4243 (2009).
5.Z. W. Zuo*, K. Zhu, L. X. Ning, G. L. Cui, J. Qu, W. X. Huang,Y. Shi,H. Liu, Composite silicon nanostructure arrays fabricated on optical fibre by chemical etching of multicrystal silicon film, Nanotechnology, 26, 155601 (2015).
6.Z. W. Zuo*, K. Zhu, L. X. Ning, G. L. Cui, J. Qu, Y.Cheng,J. Z. Wang, Y. Shi, D. S. Xu, Y. Xin, Highly sensitive surface enhanced Raman scattering substrates based on Ag decorated Si nanocone arrays and their application in trace dimethyl phthalate detection, Applied Surface Science, 25, 45 (2015).
7.Z. W. Zuo*, K. Zhu, G. L. Cui, W. X. Huang, J. Qu, Y. Shi, Y. S. Liu, G. B. Ji, Improved antireflection properties and optimized structure for passivation of well-separated, vertical silicon nanowire arrays for solarcell applications, Solar Energy Materialsand Solar Cells, 125, 248 (2014).
8. Z. W. Zuo*, G. L. Cui, Y. Shi, Y. S. Liu, G. B. Ji, Gold-thickness-dependent Schottky barrier height for charge transfer in metal-assisted chemicaletching of silicon, Nanoscale Research Letters 8, 193 (2013) .
9. Z. W. Zuo, G. L. Cui, Y. Wang,J. Z. Wang, L. Pu, Y. Shi*, Substrate-thickness dependence of hydrogenated microcrystalline silicon nucleation rate on amorphous silicon layer, Chemical Vapor Deposition 19, 363(2013).
10. Z. W. Zuo, G. L. Cui, Y. Wang,J. Z Wang, L. Pu, and Y. Shi*, GISAXS and ATR-FTIRstudies onstress-inducedmicrostructureevolution of a-Si:H under H2plasmaexposure, Chinese Physics Letters 29, 106801 (2012).
11. Z. W. Zuo, Y. Wang, J. Lu, J. Z. Wang, L. Pu, Y. Shi*, Y. D. Zheng, High rate deposition of microcrystalline silicon films using jet-type inductively coupled plasma chemical vapor deposition, Vaccum 86, 924 (2012).
12. Z. W. Zuo, W. T. Guan, Y. Wang, J. Lu, J. Z. Wang, L. Pu, Y. Shi*, Y. D. Zheng, X. Y. Luo, H. H. Wang, Influence of ultrathin amorphous silicon layers on the nucleation of microcrystalline silicon under hydrogen plasma treatment, Applied Physics Letters 98, 041902 (2011).
13. Z. W. Zuo, W. T. Guan, Y. Xin, J. Lu, J. Z. Wang, L. Pu, Y. Shi*, Y. D. Zheng, Growth and microstructure properties of microcrystalline silicon films deposited using jet-ICPCVD, Journal of Semiconductor 32 (3), 032001 (2011).
14. Z. W. Zuo, W. T. Guan, Y. Xin, J. Lu, J. Z. Wang, L. Pu, Y. Shi*, Y. D. Zheng, Crystallization control of the incubation layer in microcrystalline silicon films deposited by using jet-ICPCVD, Electrochemical and Solid-State Letters 13, H55 (2010).
15. Z. W. Zuo, Y. Wang, Y. Xin, J. Lu, J. Z. Wang, L. Pu, Y. Shi*, Y. D. Zheng, Structural evolution of the incubation layer in microcrystalline silicon films deposited by Jet-ICPCVD, 10th International Conference on Solid-state and Integrated-circuit Technology Shanghai, 1-4, Nov., 1536 (2010).
16. Y. S. Liu, G. B. Ji*, J. Y. Wang, X. Q. Liang, Z. W. Zuo, Y. Shi,Fabrication and photocatalytic properties of silicon nanowires by metal-assisted chemical etching: effect of H2O2concentration,Nanoscale Research Letters 7, 663 (2012).
17. J. Z. Wang, Z. Q. Shi, Z. S. Tao, X. L. Zhang, Z. W. Zuo, L. Pu, R. Zhang, Y. D. Zheng, F. Lu, Y. Shi*, Thermal treatment on the sensitization effect in Er-doped Si/Al2O3superlattices, ACTA PHYSICA SINICA 58, 4243 (2009).
