周艷文(遼寧省第十二屆人民代表大會代表)

周艷文(遼寧省第十二屆人民代表大會代表)

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周艷文,女,漢族,教授/博導,1966年4月出生,鞍山市政協委員,民革黨員,民革科大支部副主委,留學歸國人員,三級教授,博士生導師。2005年到遼寧科技大學工作,曾獲省優秀人才、市優秀教師、市三八紅旗手標兵、校優秀科技工作者、校優秀碩士生指導教師等榮譽稱號。

基本介紹

人物經歷,研究方向,代表性成果,主要貢獻,

人物經歷

1988年-2000年,鞍鋼從事金屬材料研究工作,先後聘任為工程師、高級工程師及東大在企業碩士生導師;
2000年-2005年,英國University of Salford, 表面工程專業,博士學位;
任免信息
2016年10月18日至19日,遼寧省14個設區的市和有關選舉單位補選周艷文等447人為遼寧省第十二屆人民代表大會代表

研究方向

1、功能材料與薄膜;
2、耐磨防腐表面強化塗層

代表性成果

論文
[1] Aluminum coating of twinning induced plasticity plates via plasma enhanced magnetron sputtering as a protential industrial rial technique, Surface and Coatings Technology, 411 (2021)126937;
[2] Evaluation of the adhesion and failure mechanism of the hard CrN coatings on different substrates,Surface and Coatings Technology, 365(2019)135-143;
[3] Local stress enhanced photocurrent of visible light photodetection in Cs2AgBiBr6 single crystal, Applied Physics Letters, 2019, 115(13): 131103.
[4] Effect of the filament discharge current on the microstructure and performance of plasma-enhanced magnetron sputtered TiN coatings,Journal of Alloys & Compounds,725 (2017)877-883;
[5] Oxygen-controlled structures and properties of transparent conductive SnO2: F films, Journal of Alloys & Compounds,695 (2017) 765-770;
[6] Characteristics of the Structure and Properties of ZnSnO3 Films by Varying the Magnetron Sputtering Parameters,Acta Metallurgica Sinica , 9 (2016): 827-833;
授權專利
1. 一種冷軋圓盤飛剪的硬質塗層及其製備方法, CN104325738B,2016.8.31;
2. 一種預防靶中毒的電漿增強磁控濺射設備,CN205741199U,2016.11.30;
3. 一種帶氮化物保護層的石墨烯電極及其製備方法,CN105931846B,2018.06.29;
4. 一種基於柔性襯底的P-I-N結太陽能電池及製備方法,CN110137297B,2020.09.22;
5. 一種製備全無機鈣鈦礦太陽能電池的磁控濺射方法,CN110246926B,2021.03.19,

主要貢獻

1. 趙卓,周艷文,劉悅,真空科學與技術,“非平衡磁控濺射二維磁場分布模似計算”Vol. 30 No. 3, Nay-Jun 2010, 265。
2. Yanwen Zhou,Zhou Zhao, Yue Liu and Peter Kelly, “Numerical simulation of magnetron fields under unbalanced and closed-field unbalanced magnetron and the effect on the feature of plasma”, Frontier of Applied Plasma Technology, Volume2, July 2009, 15-19.
3. Yanwen Zhou,Zhuo Zhao, Yie Liu, “Numerical Simulation of Magnetron Fields in Unbalanced and Closed-Field Unbalanced Magnetron”, Plasma Application & Hybrid Functional Materials, Vol.18, March 2009, 17-18.
4. Yanwen Zhou,Zhuo Zhao, “Properties of Multi-Component CrBMoS Coatings by Pulsed Magnetron Sputtering from Powder Targets”, Materials Science & Technology 2009 Conference & Exhibition, October 25-29, 2009, Pittsburgh, US.
5. Y. Zhou, PJ Kelly, QP Sun, ‘The Characteristics of the Plasma in the Powder Rig‘,Thin Solid Films, 516 (2008) 332-337.
6. PJ Kelly, A A Onifade, Y Zhou, ect., ‘The Influence of Pulse Frequency and Duty on the Deposition Rate in Pulsed Magnetron Sputtering’ Plasma Process. Polym. 2007, 4, 246-252.
7. PJ Kelly, Y Zhou‘Zinc Oxide-Based Transparent Conductive Oxide Films Prepared by Pulsed Magnetron Sputtering From Powder Targets: Process Features and Film Properties’,J. Vac. Sci. Technol. A 24(5) Sep/Oct. 20.
8. PJ Kelly, Y Zhou, etc., ‘Pulsed Magnetron Sputtering of Powder Targets: a New Development tool for multi-component Costings’, 48 SVC Annual Technical Conference Porceedings, (2005) ISSN 0737-5921.

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