潘文霞，中科院力學研究所 研究員，博士生導師，工程科學部電漿與材料工藝力學研究方向 責任研究員
基本介紹
- 中文名：潘文霞
- 國籍：中國
- 民族：漢族
- 職業：研究員
- 畢業院校：西安交通大學
- 主要成就：入選中國科學科院“百人計畫”
簡介：,現在主要研究方向：,代表論著：,承擔科研項目情況：,
簡介：
1982年1月 西安交通大學機械工程系熱處理專業學士
1982年10月 留學日本。
1988年9月在日本東京大學獲工學博士學位，後在日本大阪大學、東京大學等單位工作
1996年 回國在北京科技大學做博士後
1997年 入選中國科學科院“百人計畫”
1998年 到力學所工作
現在主要研究方向：
熱電漿的產生與狀態控制、光譜與探針診斷，高溫部分電離氣體射流的穩定性與流場測量；
電漿與材料表面的相互作用及換熱效果，實驗測量與理論分析；
電漿表層材料製備與改性，包括熱障塗層製備、抗熱衝擊性能檢測、金屬表面熔凝或熔敷強化工藝、薄膜沉積；
冷電漿薄膜工藝。
過去主要從事過鑄鐵的離子滲氮、高頻與直流疊加的熱電漿CVD法製備陶瓷納米粉、低氣壓弧光電漿燒結、電漿噴塗、電漿材料表面改性、金屬與陶瓷的接合及其界面、熱電漿CVD製備大面積金剛石膜，以及直流大氣壓層流電漿射流產生、磁擴弧電漿發生器研製等方面的研究。
代表論著：
# W.X.Pan,, X.Meng, and C.K.Wu, “Laminar plasma jets: generation, characterization and applications for material surface processing”, Pure Appl. Chem., 77(2) 2005, 373-378.
# W.X.Pan, X.Meng, Q.X.Fei and C.K.Wu, “Feasibility of laminar plasma-jet hardening of cast iron surface”, Surface & Coatings Technology, (2005).
# G. Li, W.X.Pan, X.Meng and C.K.Wu, “Application of Similarity Theory to the Characterization of Non-transferred Laminar Plasma Generation”, Plasma Sources Sci. Technol., 14 (2005) 219-225.
# , W.X.Pan and C.K.Wu, “Preliminary Investigations on Low-Pressure Laminar Plasma Spray Processing”, Surface & Coatings Technology, 191(2005)166-174.
# W. X. Pan, W. H. Zhang, W. Ma and C. K. Wu，Characteristics of argon laminar DC plasma jet at atmospheric pressure，Plasma Chemistry and Plasma Processing, 22 [2], 271-283, 2002.
# W.X.Pan, W.H.Zhang, W.H.Zhang, and C.K.Wu, “Generation of Long, Laminar Plasma Jets at Atmospheric Pressure and Effects of Flow Turbulence”, Plasma Chemistry and Plasma Pro-cessing, 21(1),2001, 23-35.
# W.X.Pan, F., W.Z.Tang, G.F.Zhong, Z.Jiang and C.K.Wu, “Carbon transition efficiency and process cost in high-rate, large-area deposition of diamond films by DC arc plasma jet”, Diamond and Related Materials, 9, 1682-1686, 2000.
# W.X.Pan, T.Okamoto and X.S.Ning, “Joining of Al-plasma-sprayed Si3N4 ceramics”, J. Mater. Sci., 29, 1436-1440. (1994).
# W.X.Pan, T.Okamoto, Y.Miyamoto, X.S.Ning, H.Matsumoto and T.Yoshida, “Plasma spray deposition of fine SiC powder”, J. Am. Ceram. Soc., 76 [5] 1335-1339 (1993).
# W.X.Pan, H.Sato, T.Yoshida and K.Akashi, “Plasma sintering of ultrafine amorphous Si3N4”, Advaced Ceramic Materials (J. Am. Ceram. Soc.), 3[1] 77-79 (1988).
* W.X.Pan, W.H.Zhang, and C.K.Wu, “Generation and characterization of laminar-flow DC plasma jet at atmospheric pressure”, 5th Asia-Pacific Conf. On Plasma Sci. & Tech., Dalian, Sep. 10-13, 2000, pp.O-04, Invited topic.
* W. X. Pan and C. K. Wu，Vacuum plasma spray for high quality TBC，JSPS Inter. Symp. on Thermal Plasma Deposition, Tokyo , Jan. 28, 2002, ed. by T. Yoshida, etc., pp.29-35, Invited.
* W. X. Pan, G. Li, X. Meng, C. K. WU, “Laminar plasma jets: generation, characterization and applications for material surface processing”, In the proceedings of ISPC-16, Taormina, Italy, 2003, P. 247. (Invited)
* Wen-Xia Pan, Xian Meng, Kai Cheng, Dong-Yan Xu, Xi Chen, Cheng-Kang Wu. Flow field comparison of laminar and turbulent DC arc plasma jets. 7th Asia Pacific Conference on Plasma Science and Technology, June 29 – July 2, 2004, Fukuoka, Japan. P. 67. (Abstract; Invited).
承擔科研項目情況：
參見 工程科學研究部 電漿與材料工藝力學組信息
