徐軍:大連理工大學物理與光電工程學院副教授三束材料改性國家重點實驗室,副教授。
基本介紹
- 中文名:徐軍
- 國籍:中國
- 學位/學歷:副教授
- 專業方向:物理與光電工程
- 職務:副教授
在電漿技術合成新材料方面,發明了微波-ECR電漿增強非平衡磁控濺射技術(已獲國家發明專利)並用該技術進行了CNx、DLC、SiNx、TiN、ZrN、NbN、Cu等多種薄膜的製備研究;博士後期間研究課題為射頻電漿輔助化學氣相沉積製備low k 互連介質材料SiOCH薄膜,發現大量納米孔洞的形成是降低SiOCH薄膜介電常數的主要機制;在電漿診斷方面,發現CN激活基團是CNx膜的生長因子,建立了CNx膜的表面反應模型。
獲得國家發明專利:
(1)一種電漿增強非平衡磁控濺射方法,專利號:ZL01116734.3
(2)用於電漿診斷的複合探針,專利號: ZL02109519.1
承擔項目:
1、國家自然科學基金重點項目(50135040):微機電系統若干關鍵機械學問題子課題,微機電系統表面改性;
2、國家自然科學基金與工程物理研究院聯合資助項目(10176005):異性件表面全方位離子注入技術研究;
3、國家自然科學基金項目(60576022):ULSI低介電常數CNx薄膜製備及其介電性能的研究;
4、國家自然科學基金項目(50572012):硼碳氮體系等電子濃度規律及其薄膜合成研究。
2. 電漿診斷及薄膜生長機理
3. 電漿源離子注入
(2)XU Jun, Chang Shil Yang, Chi Kyu Choi, Annealing Effects on the Structural and Electrical Properties of SiOCH Films with Low Dielectric Constant Prepared by Plasma Enhanced Chemical Vapor Deposition, J. Korean Physical Society, 45(1)(2004)175-179.
(3)XU Jun, Chang Shil Yang, Hae Rim Jang, Chi Kyu Choi, Chemical Structure Evolution of SiOCH Films with Low Dielectric Constant During Plasma Enhanced Chemical Vapor Deposition and Post-annealing Procedures, J. Electrochemical Society, 150(12)(2003)F206-210.
(4)XU Jun, MA Tengcai, ZHANG Jialiang, DENG Xinlu, Alessio Perrone, Investigation on Optical Emission Spectra during ECR Plasma Enhanced Magnetron Sputtering Carbon Nitride Films Deposition, Int. J. Modern Physics B, 16(2002)1120-1126.
(5) XU Jun, DENG Xinlu, LU Wenqi, MA Tengcai, Characterization of CNx Films Prepared by Twinned ECR Plasma Source Enhanced DC Magnetron Sputtering, Thin Solid Films, 390(1-2)(2001)107-112.
(6) XU Jun, DENG Xinlu, YU Shiji, LU Wenqi, MA Tengcai, Plasma Enhanced Direct Current Planar Magnetron Sputtering Technique Employing a Twinned Microwave Electron Cyclotron Resonance Plasma Sources, J. Vacuum Science and Technology A, 19(2)(2001)425-428.
(7) XU Jun, MA Tengcai, LU Wenqi, DENG Xinlu, Deposition of Carbon Nitride Films by Plasma Enhanced DC Magnetron Sputtering Using Twinned Microwave ECR Plasma Source, Journal of the Korean Vacuum Society, 9(1)(2000)95-101.
(8) XU Jun, MA Tengcai, LU Wenqi, DENG Xinlu, A New Method for Thin Film Deposition: Faced Microwave Electron Cyclotron Resonance Plasma Sources Enhanced Direct Current Magnetron Sputtering, Chinese Physics Letters, 17(8)(2000)586-588.